Oxide Molecular Beam Epitaxy System
Oxide molecular-beam epitaxy system (OMBE, M600, DCA Instruments Oy, Finland) is a fabrication system for synthesizing ultraclean oxides thin-film materials with atomic-scale precision, in ultra-high vacuum (UHV) condition. The cassette load lock chamber allows for quick loading of the substrate into the system, before transferring into the growth chamber. The UHV chamber is equipped with 9 pumped effusion cells, which allows 9 types of high purity metallic sources to work together. The quality of the growth is monitored by a real-time reflection high energy electron diffraction system (RHEED) and a quartz crystal microbalance (QCM, SQM-160, INFICON, Switzerland) is applied to measure the absolute deposition rates. Electro-pneumatic linear shutters provide an accurate control of the layer-by-layer deposition process with the small fraction precision of an atomic monolayer. The modular design of the OMBE system allows for fast easy reload and metal source replacement, which provides greater flexibility when depositing high-quality complex oxides and their heterostructures at the atomic layer level, including high temperature superconductors.
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